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MAIN
COMPONENTS:
- Fast entry
load-lock introduction chamber
- Radial
distribution chamber
- UHV analytical
chamber with 4-axes (x, y, z, rotation) stage and a heater
- UHV
deposition chamber with high-precion heated manipulator
- Delta 0.5
HREELS spectrometer (SPECS), energy resolution FWHM < 1 meV
- LEED/AES
Spectrometer
- Two effusion
cells for MBE (Createc)
- Electron beam
evaporator (Oxford Instr.)
- Quartz-crystal thickness monitor (Oxford Instr.)
- In-situ
cleaver
- IMS,
ion source for sputter etching (Omikron)
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General view |
MBE and EBE deposition chamber |
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EELS chamber |
LEED chamber |
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Delta 0.5 HREELS analyzer |
Ion source |
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Sample requirements:
upto 0.5" diameter and 6 mm thickness
Holders: Kratos stub holders are used, see
Axis-165 for photos
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| Location: CME-180 |
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