Mitlin Group Chemical and Materials Engineering Univerity of Alberta

NINT 5-012

Our primary research facility.

Equipment

• Three AJA Orion co-sputtering PVD systems

  Create thin films of virtually any material or alloy, with in-situ reflectometry and stress measurements.

• Four HyEnergy Sievert's Apparatus

  Volumetric studies of hydrogen adsorption and desorption.

• Two TA Differential Scanning Calorimeters

  Gravimetric measurements of hydrogen desorption in powders or thin films.

• BET Gas Adsorption Equipment

  Used to measure surface area of nanostructures

• Dimpler, Electropolisher, Grinder and Diamond Saw

  Sample preparation for TEM.

• Planetary Ball Mill

  Ball mill powder samples inside an argon glove box.

• Three Zone Carbolite CVD Furnace

  Currently used for sintering of Molydenum(99).

• Chemical processing deck

  For etching and cleaning.

NINT 3-093

Electronics development laboratory.

Equipment

• Environmental testing chamber (-40°C to 180°C)

• High pressure flow loop (1500psi)

• Agilent network/spectrum analyzer 100kHz to 1.8GHz

• Agilent 9000 four channel DSO oscilloscope

• Arbitrary wave form generator

• Agilent E4980A Perceision LCR meter

• SRS 830DSP Digital lock in amplifier

• SR 560 low noise voltage preamplifier

CME 360

Battery and supercapacitor testing facility

Equipment

• TEM sample preparation and metallographic sectioning and polishing equipment

• Wafer spin coater with vacuum chamber and curing oven

• Carbolyte thermal cycling chamber (-100°C to 300°C for high speed cooling and heating)

• 8 channel Solatron potentiostat with impedance analysis capability

• 16 channel Arbin potentiostat with ultra low current option

• 20 channel Arbin postentiostat with low current option

• Single channel Versastat potentiostat with impedance analysis capability

NINT 3-006

Wet electrochemistry

Equipment

• Equipped for wet chemistry and electrodeposition

• Single channel biologic potentiostat with ultra low current option

Electrical and Computer Engineering building

An open access facility with deposition, microfabrication and processing equipment including:

• Physical vapour deposition systems

  Sputtering and evapouration of thin films

• Lithography

  Both optical and electron beam lithography allows for virtually any scale of devices to be created.

• Chemical vapour deposition systems

  For deposition of oxides and nitrides.

• Etching processes

  Many different chemical and plasma etches for silicon, silicon nitride or oxide, metals and glass.

A multidisciplinary institute operated as a partnership between the University of Alberta and the National Research Council of Canada.